Endpoint Detection - Optical Emission Spectroscopy (OES)

• Endpoint Detection of Low Open Area Contact Etches from Optical Emission Spectroscopy Measurements (PDF)
• Use of Spectrometer-based OES for SiN Etch Selectivity and Endpoint Optimization (PDF)

Endpoint Detection - Interferometric (IEP)

• In-Site UV-Visible Reflectometry for STL Recess and Gate Etch Endpoint (PDF)

Film Thickness Measurement

• Heterodyne Reflectometry for Angstroms-thick Thin Films (PDF)
• Large Spot Reflectometry for CVD Process Control (PDF)